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MICROSYSTEMS MICROSYS 200
    Description
    No description
    Configuration
    Plasma Enhanced CVD system (PECVD) Deposition of SiO2, Si3N4 and a-Si RF power: 0-400 W ICP power: 0-1300 W Temperatures: RT to 300°C Gases available: Ar, SiH4, NH3, N2, O2, NF3, N2O He for substrate heat transfer Maximum wafer size: 4"
    OEM Model Description
    Plasma Enhanced CVD system (PECVD)
    Documents

    No documents

    MICROSYSTEMS

    MICROSYS 200

    verified-listing-icon

    Verified

    CATEGORY
    PECVD

    Last Verified: Over 60 days ago

    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    97600

    Wafer Sizes:

    4"/100mm

    Vintage:

    Unknown

    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
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    MICROSYSTEMS MICROSYS 200

    MICROSYSTEMS

    MICROSYS 200

    PECVD
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    MICROSYSTEMS

    MICROSYS 200

    verified-listing-icon
    Verified
    CATEGORY
    PECVD
    Last Verified: Over 60 days ago
    listing-photo-4469181d504148778026584238b8b97a-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/54225/4469181d504148778026584238b8b97a/eb6f5554ff2445c59ba4a1ecac66a231_a98d6d42000c41e1868d340e6ab13fa81201a_mw.jpeg
    listing-photo-4469181d504148778026584238b8b97a-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/54225/4469181d504148778026584238b8b97a/a7dad8ae332047688913ba9be4095027_55ace7ffdc6348bbb26b863ef47e085f_mw.jpeg
    listing-photo-4469181d504148778026584238b8b97a-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/54225/4469181d504148778026584238b8b97a/0b3a9013ef20494ab11c5c358d32232a_3227b227de3a4f37ba9f4ee5d2a36ca21201a_mw.jpeg
    listing-photo-4469181d504148778026584238b8b97a-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/54225/4469181d504148778026584238b8b97a/157a70c16b514a92bff0673bd9d36271_675890a773c547bb9961d01cf0f442a71201a_mw.jpeg
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    97600

    Wafer Sizes:

    4"/100mm

    Vintage:

    Unknown

    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    Plasma Enhanced CVD system (PECVD) Deposition of SiO2, Si3N4 and a-Si RF power: 0-400 W ICP power: 0-1300 W Temperatures: RT to 300°C Gases available: Ar, SiH4, NH3, N2, O2, NF3, N2O He for substrate heat transfer Maximum wafer size: 4"
    OEM Model Description
    Plasma Enhanced CVD system (PECVD)
    Documents

    No documents

    Similar Listings
    View All
    MICROSYSTEMS MICROSYS 200

    MICROSYSTEMS

    MICROSYS 200

    PECVDVintage: 0Condition: UsedLast Verified:Over 60 days ago