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MICROSYSTEMS MICROSYS 200
  • MICROSYSTEMS MICROSYS 200
  • MICROSYSTEMS MICROSYS 200
  • MICROSYSTEMS MICROSYS 200
  • MICROSYSTEMS MICROSYS 200
Description
No description
Configuration
Plasma Enhanced CVD system (PECVD) Deposition of SiO2, Si3N4 and a-Si RF power: 0-400 W ICP power: 0-1300 W Temperatures: RT to 300°C Gases available: Ar, SiH4, NH3, N2, O2, NF3, N2O He for substrate heat transfer Maximum wafer size: 4"
OEM Model Description
Plasma Enhanced CVD system (PECVD)
Documents

No documents

MICROSYSTEMS

MICROSYS 200

verified-listing-icon

Verified

CATEGORY
PECVD

Last Verified: Over 60 days ago

Key Item Details
Condition:

Used

Operational Status:

Unknown

Product ID:

97600

Wafer Sizes:

4"/100mm

Vintage:

Unknown

Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
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MICROSYSTEMS MICROSYS 200

MICROSYSTEMS

MICROSYS 200

PECVD
Vintage: 0Condition: Used
Last VerifiedOver 60 days ago

MICROSYSTEMS

MICROSYS 200

verified-listing-icon
Verified
CATEGORY
PECVD
Last Verified: Over 60 days ago
listing-photo-4469181d504148778026584238b8b97a-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/54225/4469181d504148778026584238b8b97a/eb6f5554ff2445c59ba4a1ecac66a231_a98d6d42000c41e1868d340e6ab13fa81201a_mw.jpeg
listing-photo-4469181d504148778026584238b8b97a-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/54225/4469181d504148778026584238b8b97a/a7dad8ae332047688913ba9be4095027_55ace7ffdc6348bbb26b863ef47e085f_mw.jpeg
listing-photo-4469181d504148778026584238b8b97a-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/54225/4469181d504148778026584238b8b97a/0b3a9013ef20494ab11c5c358d32232a_3227b227de3a4f37ba9f4ee5d2a36ca21201a_mw.jpeg
listing-photo-4469181d504148778026584238b8b97a-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/54225/4469181d504148778026584238b8b97a/157a70c16b514a92bff0673bd9d36271_675890a773c547bb9961d01cf0f442a71201a_mw.jpeg
Key Item Details
Condition:

Used

Operational Status:

Unknown

Product ID:

97600

Wafer Sizes:

4"/100mm

Vintage:

Unknown

Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No description
Configuration
Plasma Enhanced CVD system (PECVD) Deposition of SiO2, Si3N4 and a-Si RF power: 0-400 W ICP power: 0-1300 W Temperatures: RT to 300°C Gases available: Ar, SiH4, NH3, N2, O2, NF3, N2O He for substrate heat transfer Maximum wafer size: 4"
OEM Model Description
Plasma Enhanced CVD system (PECVD)
Documents

No documents

Similar Listings
View All
MICROSYSTEMS MICROSYS 200

MICROSYSTEMS

MICROSYS 200

PECVDVintage: 0Condition: UsedLast Verified:Over 60 days ago