Description
[2nd SOURCE NEW ONLY] ## Technical Specifications: 8-inch AlN Ceramic Heater (PN: 0010-38438) Core Performance & Thermal Properties Wafer Size: Optimized for 200mm (8-inch) semiconductor platforms. Operating Temperature: Stable and reliable up to < 700°C. Thermal Conductivity: High-grade 170 W/m·K for rapid heat-up and uniform distribution. Thermal Expansion: Coefficient similar to Silicon (Si), minimizing wafer stress and displacement. Temperature Uniformity: Excellent across the 8-inch surface for consistent process results. Material & Reliability Material: High-purity Aluminum Nitride (AlN) Ceramic. Plasma Resistance: Excellent durability against aggressive etching and cleaning gases (NF3, CF4, etc.). Anti-Corrosion: Superior chemical resistance in high-vacuum environments. Durability: Robust mechanical design for long-lifecycle performance in high-volume fabs.Configuration
No ConfigurationOEM Model Description
None ProvidedDocuments
No documents
CATEGORY
Parts
Last Verified: 5 days ago
Key Item Details
Condition:
New
Operational Status:
Deinstalled
Product ID:
145693
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
0010-38438
CATEGORY
Parts
Last Verified: 5 days ago
Key Item Details
Condition:
New
Operational Status:
Deinstalled
Product ID:
145693
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
[2nd SOURCE NEW ONLY] ## Technical Specifications: 8-inch AlN Ceramic Heater (PN: 0010-38438) Core Performance & Thermal Properties Wafer Size: Optimized for 200mm (8-inch) semiconductor platforms. Operating Temperature: Stable and reliable up to < 700°C. Thermal Conductivity: High-grade 170 W/m·K for rapid heat-up and uniform distribution. Thermal Expansion: Coefficient similar to Silicon (Si), minimizing wafer stress and displacement. Temperature Uniformity: Excellent across the 8-inch surface for consistent process results. Material & Reliability Material: High-purity Aluminum Nitride (AlN) Ceramic. Plasma Resistance: Excellent durability against aggressive etching and cleaning gases (NF3, CF4, etc.). Anti-Corrosion: Superior chemical resistance in high-vacuum environments. Durability: Robust mechanical design for long-lifecycle performance in high-volume fabs.Configuration
No ConfigurationOEM Model Description
None ProvidedDocuments
No documents