Description
[OPM NEW & 2nd SOURCE NEW ONLY] - Technical Specifications: 1. Core Performance & Thermal Properties Operating Temperature: Recommended up to < 700°C (Optimal for AlN stability). Thermal Conductivity: High-performance 170 W/m·K for superior heat transfer. Temperature Uniformity: Excellent distribution across the entire 200mm surface. Thermal Expansion: Coefficient similar to Silicon (Si), minimizing wafer stress and slippage during thermal cycling. 2. Material Reliability Plasma Resistance: Excellent durability against erosive cleaning gases (NF3, CF4, etc.). Anti-Corrosion: High resistance to chemical attack in aggressive deposition environments. Durability: Engineered for long-lifecycle performance in high-duty cycle fabs. 3.Applications This heater assembly is specifically designed for high-precision semiconductor vacuum processes: CVD (Chemical Vapor Deposition) ALD (Atomic Layer Deposition) Diffusion AnnealingConfiguration
No ConfigurationOEM Model Description
Ceramic Heater AssyDocuments
No documents
CATEGORY
Parts
Last Verified: Yesterday
Key Item Details
Condition:
New
Operational Status:
Deinstalled
Product ID:
145694
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
0010-03840
CATEGORY
Parts
Last Verified: Yesterday
Key Item Details
Condition:
New
Operational Status:
Deinstalled
Product ID:
145694
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
[OPM NEW & 2nd SOURCE NEW ONLY] - Technical Specifications: 1. Core Performance & Thermal Properties Operating Temperature: Recommended up to < 700°C (Optimal for AlN stability). Thermal Conductivity: High-performance 170 W/m·K for superior heat transfer. Temperature Uniformity: Excellent distribution across the entire 200mm surface. Thermal Expansion: Coefficient similar to Silicon (Si), minimizing wafer stress and slippage during thermal cycling. 2. Material Reliability Plasma Resistance: Excellent durability against erosive cleaning gases (NF3, CF4, etc.). Anti-Corrosion: High resistance to chemical attack in aggressive deposition environments. Durability: Engineered for long-lifecycle performance in high-duty cycle fabs. 3.Applications This heater assembly is specifically designed for high-precision semiconductor vacuum processes: CVD (Chemical Vapor Deposition) ALD (Atomic Layer Deposition) Diffusion AnnealingConfiguration
No ConfigurationOEM Model Description
Ceramic Heater AssyDocuments
No documents