Description
AMEC PD5 MOCVDConfiguration
System Configuration: ▪ Process Application: GaN Epitaxy ▪ Vintage: Oct 2020 ▪ Wafer Type: 11x4”, 6x6”, 3x8” GaN on Silicon/SiC ▪ Transfer Module: Yes, able to support up to 4 chambers ▪ Pump: Edwards iXH645H ▪ Chiller: SMC ▪ MFCs Type: Horiba ▪ MO Configuration: TMGa1/2, TMAl1/2, TEGa, Cp2Fe, TMIn, Cp2Mg ▪ Doping Source: 2x External Dopant inlet ▪ Inline Purifiers: H2, N2, NH3 ▪ Dew Point Sensor: H2, N2 Process Startup: ▪ Process demonstration for Breakdown Voltage >650V ▪ 650V HEMT recipe will be providedOEM Model Description
MOCVD system for production of GaN power devicesDocuments
CATEGORY
MOCVD
Last Verified: 12 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
139498
Wafer Sizes:
Unknown
Vintage:
2020
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA (AMEC)
Prismo PD5
CATEGORY
MOCVD
Last Verified: 12 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
139498
Wafer Sizes:
Unknown
Vintage:
2020
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available