Description
No descriptionConfiguration
AIX GS WW C Planetary Reactor for deposition on 8 x150 mm wafers Computer control system MES interface SECS II/GEM for MOVPE systems (incl. router) GAS HANDLING SYSTEM Standard metalorganic channel [MOG1] with 2 LOTO hand valves as customer interface; bubbler placed outside GMS cabinet (1xTCS) Combined standard and dilution metalorganic channel [MOG1/G3-D] (2xTMAI) Standard gas channel with pusher, for low flow [MOG2] (1xNN, 1xHCI) Triple-Cascading standard gas channel with pusher [MOG2-T] (3xC3H8) Combined standard and dilution/dopant gas channel [MOG2/G4-D] (2xN2) Additional pusher for MO-G4 (1xN2) Carrier gas channel (Dummy line) for balancing gas flow switching (1xR/V Center, 1xR/V Bottom) MO-differential run/vent pressure balancing (1xMO, 1xR/V center) MO-Vac High Pressure Purge Epison 5 (1xTCS) PROCESS CONTROL EpiCurve TT® AR 3W Automatic Feed Forward incl. Autosat GAS PURIFICATION Spare provision for standard purifier HCI Spare provision for standard purifier (C3H8) Single Port Hygrometer incl. valve and housing (H2/N2)) Ar limiter AUTOMATION Automatic Cassette to Cassette wafer handler for high temperature operation (600C)OEM Model Description
AIX G5 WW C Planetary Reactor for 150 mm SiCDocuments
No documents
AIXTRON
AIX G5 WW C
Verified
CATEGORY
MOCVD
Last Verified: 4 days ago
Key Item Details
Condition:
New
Operational Status:
Unknown
Product ID:
117152
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View All
AIXTRON
AIX G5 WW C
CATEGORY
MOCVD
Last Verified: 4 days ago
Key Item Details
Condition:
New
Operational Status:
Unknown
Product ID:
117152
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
AIX GS WW C Planetary Reactor for deposition on 8 x150 mm wafers Computer control system MES interface SECS II/GEM for MOVPE systems (incl. router) GAS HANDLING SYSTEM Standard metalorganic channel [MOG1] with 2 LOTO hand valves as customer interface; bubbler placed outside GMS cabinet (1xTCS) Combined standard and dilution metalorganic channel [MOG1/G3-D] (2xTMAI) Standard gas channel with pusher, for low flow [MOG2] (1xNN, 1xHCI) Triple-Cascading standard gas channel with pusher [MOG2-T] (3xC3H8) Combined standard and dilution/dopant gas channel [MOG2/G4-D] (2xN2) Additional pusher for MO-G4 (1xN2) Carrier gas channel (Dummy line) for balancing gas flow switching (1xR/V Center, 1xR/V Bottom) MO-differential run/vent pressure balancing (1xMO, 1xR/V center) MO-Vac High Pressure Purge Epison 5 (1xTCS) PROCESS CONTROL EpiCurve TT® AR 3W Automatic Feed Forward incl. Autosat GAS PURIFICATION Spare provision for standard purifier HCI Spare provision for standard purifier (C3H8) Single Port Hygrometer incl. valve and housing (H2/N2)) Ar limiter AUTOMATION Automatic Cassette to Cassette wafer handler for high temperature operation (600C)OEM Model Description
AIX G5 WW C Planetary Reactor for 150 mm SiCDocuments
No documents