Description
No descriptionConfiguration
- 8X6 Configuration - Heated exhaust from chamber to filter assembly - Dual filter assembly Inverted and Phoniex filter - VAT Throttle Valve - Extra Pressure sensors for both exhaust streams (Hydride and CL2) - Internal scrubber switching - EPITT Version 2 - EPISON on Dopant MO line plus heating from bubbler to Run/Vent line - Ebara ESA100WN process pump - Two Triscroll pumps: for glovebox and Antechamber - Aixact version 7.6..2.1 - Process module 208VAC, RF Generator 480VAC - No transfer modulesOEM Model Description
The G5 series reactors typically feature AIXTRON's Planetary Reactor technology, which allows for high-quality, uniform growth of films. This is achieved by rotating the substrate wafers around a central point, similar to the planets orbiting the sun, while gases are injected into the chamber.Documents
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AIXTRON
AIX G5
CATEGORY
MOCVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
117155
Wafer Sizes:
Unknown
Vintage:
2014
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
- 8X6 Configuration - Heated exhaust from chamber to filter assembly - Dual filter assembly Inverted and Phoniex filter - VAT Throttle Valve - Extra Pressure sensors for both exhaust streams (Hydride and CL2) - Internal scrubber switching - EPITT Version 2 - EPISON on Dopant MO line plus heating from bubbler to Run/Vent line - Ebara ESA100WN process pump - Two Triscroll pumps: for glovebox and Antechamber - Aixact version 7.6..2.1 - Process module 208VAC, RF Generator 480VAC - No transfer modulesOEM Model Description
The G5 series reactors typically feature AIXTRON's Planetary Reactor technology, which allows for high-quality, uniform growth of films. This is achieved by rotating the substrate wafers around a central point, similar to the planets orbiting the sun, while gases are injected into the chamber.Documents
No documents