Description

SSM5130 HG CV

Configuration

■ SSM 52 Capacitance Measurement Unit ■ Auto wafer handling (Genmark robot & pre aligner) ■ Motor control unit ■ Pneumatic control Unit ■ PC System ■ PROCAP software ■ Performance - CV Meter Noise Test (Schottky Diode Test): 1 STD(%) <0.167% - MOS Wafer Area Test : 1 STD(%) <0.1% ■ Capacitance: 0.5~ 2000pF ■ Conductance: 0.5 ~ 2000μS ■ DC Bias voltage: ± 250V ■ Ramp Rate: 0 ~ 50 V/s continuously variable ■ Drive Signal Frequency at 1Mhz voltage=15mV rms ■Stress Voltage: ± 250V ■ CDA: 80~100psi, Nitrogen for sample purge:0~15psi ■ Ambient temperature: 18° - 25°C ± 2°C over 24 hour period

OEM Model Description

The SSM 5130 is a fully automatic mapping system that provides a variety of electrical characterization measurements for non-patterned wafers used in epitaxial silicon production and front-end semiconductor processing. Wafers are robotically loaded onto the mapping stage from a cassette or opened FOUP, and the test wafer moves to each site specified in a pre-programmed map as electrical characterization tests are made. The system stores test data and reports it in a variety of formats. The SSM 5130 eliminates the need for costly metal and poly deposition processes by using a pneumatically controlled, non-damaging probe design and a top-side mercury contact. With separate probe and chuck vacuum lines, the system features an extremely stable contact area and uses only a small quantity of mercury to make highly repeatable measurements for process development and process monitoring applications. Typical applications of the SSM 5130 include EPI resistivity, low-k dielectric constant, and oxide integrity. The SSM 5130 can handle wafer diameters from 200 mm to 300 mm, and offers single-site and multiple-site maps. Automatic face-up loading prevents wafer damage, and precision pressure regulators are used for Hg contact. The PROCAP software provides a full suite of measurements.