Description
No descriptionConfiguration
No ConfigurationOEM Model Description
SEN CORPORATION / SUMITOMO NV-MC3 is a high-performance medium current ion implantation system that is suitable for 300 mm to 150 mm wafers. It is designed to achieve the highest implantation quality in the world, with an implantation energy range of 5 keV to 750 keV. The system minimizes metal and energy contamination, and reduces implantation angle deviation and beam shape change through the use of a left-right symmetric beam line. It also improves uniformity by reducing beam divergence and fixing the implant position with a unique scanning method. The NV-MC3 supports heavy ion implantation as standard, and is highly reliable and maintainable.Documents
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SEN CORPORATION / SUMITOMO
NV MC3
Verified
CATEGORY
Medium Current
Last Verified: 3 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
119327
Wafer Sizes:
8"/200mm
Vintage:
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SEN CORPORATION / SUMITOMO
NV MC3
CATEGORY
Medium Current
Last Verified: 3 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
119327
Wafer Sizes:
8"/200mm
Vintage:
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
SEN CORPORATION / SUMITOMO NV-MC3 is a high-performance medium current ion implantation system that is suitable for 300 mm to 150 mm wafers. It is designed to achieve the highest implantation quality in the world, with an implantation energy range of 5 keV to 750 keV. The system minimizes metal and energy contamination, and reduces implantation angle deviation and beam shape change through the use of a left-right symmetric beam line. It also improves uniformity by reducing beam divergence and fixing the implant position with a unique scanning method. The NV-MC3 supports heavy ion implantation as standard, and is highly reliable and maintainable.Documents
No documents