Description

1.1 The MPA-600 lithography equipment is second-hand equipment. After debugging, it should meet the requirements of automatic exposure of 6-inch silicon wafers. 1.2 The lighting source is a high-pressure spherical mercury lamp with a spectrum of G/H/I mixed lines. 1.3 The exposure method is 1:1 projection of the pattern on the reticle onto the wafer and exposure in a scanning manner. 1.4 Operation mode: manual and semi-automatic exposure modes, easy to operate and maintain. 1.5 High efficiency and good stability. 1.6 There is sufficient supply of spare parts

Configuration

Mask Aligner

OEM Model Description

The Canon MPA-600FA is a high-throughput mirror projection mask aligner delivers stable performance ideal for VLSI chip production, boasting a 1.5um resolution and +/- 6um depth-of-focus across the entire field for 4”, 5”, and 6” wafers. With field-proven auto alignment via laser scanning, target placement in scribe lines, and seamless compatibility for mix-and-match with steppers, it's a top-tier solution for precision alignments.

Documents

CANON MPA-600FA.pdf

CANON

MPA-600FA

Verified

Mask/Bond Aligners

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

127060

Wafer Sizes:

4"/100mm, 5"/125mm, 6"/150mm, 8"/200mm

Vintage:

2006

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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