Description
Working condition, no known issuesConfiguration
• Windows Based Operator Workstation • Drawer in Front (B) Base Configuration • Robotic Loader • PATMAX MVS Alignment System • Step Specific Processing Mode Software • 30 x 15 mm Field Size - Manual Aperture • 6-inSubstrates • 3 X 5 Inch Reticles • Lens Distortion Reference - No Lens Matching • 115V Power Source • Four Color Signal Light Tower • Single Probe Focus Software • Focus Mapping (Grid Focus) Software • MVS Manual Alignment Software • Topside EGA Software * Wafer Thickness Compensator (4 mm Max Thickness)OEM Model Description
The Sapphire 100 is also based on the 1000 Series platform, with additional features developed specifically for HBLED lithography applications. HBLED manufacturing requires special substrate handling capabilities for the small diameter sapphire and silicon carbide substrates used to manufacture the LED devices for display backlighting and general lighting applications. For HBLED applications, we believe our Sapphire 100 stepper offers depth of focus, productivity and yield improvement advantages over competitive product offerings.Documents
No documents
VEECO / ULTRATECH
SAPPHIRE 100
Verified
CATEGORY
Lithography
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Running
Product ID:
90681
Wafer Sizes:
2"/50mm, 3"/75mm, 4"/100mm
Vintage:
2011
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
VEECO / ULTRATECH
SAPPHIRE 100
CATEGORY
Lithography
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Running
Product ID:
90681
Wafer Sizes:
2"/50mm, 3"/75mm, 4"/100mm
Vintage:
2011
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Working condition, no known issuesConfiguration
• Windows Based Operator Workstation • Drawer in Front (B) Base Configuration • Robotic Loader • PATMAX MVS Alignment System • Step Specific Processing Mode Software • 30 x 15 mm Field Size - Manual Aperture • 6-inSubstrates • 3 X 5 Inch Reticles • Lens Distortion Reference - No Lens Matching • 115V Power Source • Four Color Signal Light Tower • Single Probe Focus Software • Focus Mapping (Grid Focus) Software • MVS Manual Alignment Software • Topside EGA Software * Wafer Thickness Compensator (4 mm Max Thickness)OEM Model Description
The Sapphire 100 is also based on the 1000 Series platform, with additional features developed specifically for HBLED lithography applications. HBLED manufacturing requires special substrate handling capabilities for the small diameter sapphire and silicon carbide substrates used to manufacture the LED devices for display backlighting and general lighting applications. For HBLED applications, we believe our Sapphire 100 stepper offers depth of focus, productivity and yield improvement advantages over competitive product offerings.Documents
No documents