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RAITH ionLINE Plus
    Description
    High Resolution FIB-SEM, with Lithography capability -Excellent beam spot and low beam tails -FIB nano-fabrication beyond Gallium -Sub-10 nm FIB nano-fabrication -NanoFabrication with ion species beyond Gallium -Rapid, versatile manual operation -Advanced lithographic automated operation -Direct Patterning Ion milling -Exposure of photoresist, maskless ion implanting and hard masking. -Ion beam induced deposition, and gas-assisted etching -Cross-sectioning and sample preparation -Circuit editting and modification -Laser Interferometer stage allows field stitching and continuous write -Cartesian Nanomanipulators allow in-situ probing and Nanoprofiling -It has automated focus control -It is fitted with various optical cameras
    Configuration
    No Configuration
    OEM Model Description
    None Provided
    Documents

    No documents

    RAITH

    ionLINE Plus

    verified-listing-icon

    Verified

    CATEGORY
    Lithography

    Last Verified: 4 days ago

    Key Item Details
    Condition:

    Used

    Operational Status:

    Deinstalled

    Product ID:

    148405

    Wafer Sizes:

    Unknown

    Vintage:

    2017

    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    RAITH ionLINE Plus

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    RAITH ionLINE Plus

    RAITH

    ionLINE Plus

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    Vintage: 2017Condition: Used
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    RAITH ionLINE Plus

    RAITH

    ionLINE Plus

    Lithography
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    RAITH

    ionLINE Plus

    verified-listing-icon
    Verified
    CATEGORY
    Lithography
    Last Verified: 4 days ago
    listing-photo-a789244700c04ba7881c933e2ca6a359-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1289/a789244700c04ba7881c933e2ca6a359/eb8f4300a8e24594b2d8c8b0ae8eec60_568e276862564bb1bc2024f4f6eb2f2f_mw.jpeg
    listing-photo-a789244700c04ba7881c933e2ca6a359-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1289/a789244700c04ba7881c933e2ca6a359/e4756d3347384168a017ad122256ec14_c7a5b452fa5c47aba55b10d0c3ddae931201a_mw.jpeg
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    listing-photo-a789244700c04ba7881c933e2ca6a359-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1289/a789244700c04ba7881c933e2ca6a359/de3efa3d856c4def96e2ef6a01cf827f_29dfdd5267a3458b954947427d3a2335_mw.jpeg
    listing-photo-a789244700c04ba7881c933e2ca6a359-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1289/a789244700c04ba7881c933e2ca6a359/8e96add45d1d4c878544f4667cb1f220_9041673847854031903c3c8dbc8e00cb_mw.jpeg
    listing-photo-a789244700c04ba7881c933e2ca6a359-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1289/a789244700c04ba7881c933e2ca6a359/c00bfb4983f44f5d88b5c632b5316e79_61de481912a0455fb6c9258e4629f8e4_mw.jpeg
    listing-photo-a789244700c04ba7881c933e2ca6a359-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1289/a789244700c04ba7881c933e2ca6a359/a795a7e98409413eaa523789f669ea23_88f44be9c3ce41f2b2ac14f30255d475_mw.jpeg
    listing-photo-a789244700c04ba7881c933e2ca6a359-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1289/a789244700c04ba7881c933e2ca6a359/3fd8b55e3bcc412da3b4e1ebe5de0670_b9c9a959b8914658b885bb0dd303bb6c_mw.jpeg
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    listing-photo-a789244700c04ba7881c933e2ca6a359-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1289/a789244700c04ba7881c933e2ca6a359/3dde48ce4dac44d091c3a3f37144aa80_82452cdb7ebf43fb9a01138ba085f80c_mw.jpeg
    Key Item Details
    Condition:

    Used

    Operational Status:

    Deinstalled

    Product ID:

    148405

    Wafer Sizes:

    Unknown

    Vintage:

    2017

    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    High Resolution FIB-SEM, with Lithography capability -Excellent beam spot and low beam tails -FIB nano-fabrication beyond Gallium -Sub-10 nm FIB nano-fabrication -NanoFabrication with ion species beyond Gallium -Rapid, versatile manual operation -Advanced lithographic automated operation -Direct Patterning Ion milling -Exposure of photoresist, maskless ion implanting and hard masking. -Ion beam induced deposition, and gas-assisted etching -Cross-sectioning and sample preparation -Circuit editting and modification -Laser Interferometer stage allows field stitching and continuous write -Cartesian Nanomanipulators allow in-situ probing and Nanoprofiling -It has automated focus control -It is fitted with various optical cameras
    Configuration
    No Configuration
    OEM Model Description
    None Provided
    Documents

    No documents

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    View All
    RAITH ionLINE Plus

    RAITH

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    RAITH ionLINE Plus

    RAITH

    ionLINE Plus

    LithographyVintage: 2017Condition: UsedLast Verified:4 days ago
    RAITH ionLINE Plus

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    LithographyVintage: 0Condition: UsedLast Verified:Over 60 days ago