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6" Fab For Sale from Moov - Click Here to Learn More
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RAITH 150 TWO
    Description
    No description
    Configuration
    -Low kV Exposure and Imaging with Inlens SE Detector with BSE Detector Option -Accelerating Voltage up to 30kV -20 MHz Digital Pattern Generator -Stitching and Overlay Accuracy about 35nm
    OEM Model Description
    The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.
    Documents

    No documents

    RAITH

    150 TWO

    verified-listing-icon

    Verified

    CATEGORY
    Lithography

    Last Verified: 28 days ago

    Key Item Details
    Condition:

    Used

    Operational Status:

    Installed / Idle

    Product ID:

    114027

    Wafer Sizes:

    6"/150mm

    Vintage:

    Unknown

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
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    RAITH 150 TWO

    RAITH

    150 TWO

    Lithography
    Vintage: 0Condition: Used
    Last Verified28 days ago

    RAITH

    150 TWO

    verified-listing-icon
    Verified
    CATEGORY
    Lithography
    Last Verified: 28 days ago
    listing-photo-954df4f54c4a46b18ff206e60a2f47e5-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/83967/954df4f54c4a46b18ff206e60a2f47e5/81a01d81c5d34f368cf0596b659373d2_38306936112c4f5a9acad8a3e4ca7d7c_mw.jpeg
    listing-photo-954df4f54c4a46b18ff206e60a2f47e5-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/83967/954df4f54c4a46b18ff206e60a2f47e5/0a7a4b14e0a84fffab4bdceb026ec3ba_0df71e1468df483abf9d1e38e28d01531201a_mw.jpeg
    Key Item Details
    Condition:

    Used

    Operational Status:

    Installed / Idle

    Product ID:

    114027

    Wafer Sizes:

    6"/150mm

    Vintage:

    Unknown

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    -Low kV Exposure and Imaging with Inlens SE Detector with BSE Detector Option -Accelerating Voltage up to 30kV -20 MHz Digital Pattern Generator -Stitching and Overlay Accuracy about 35nm
    OEM Model Description
    The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.
    Documents

    No documents

    Similar Listings
    View All
    RAITH 150 TWO

    RAITH

    150 TWO

    LithographyVintage: 0Condition: UsedLast Verified:28 days ago