Description
No descriptionConfiguration
-Low kV Exposure and Imaging with Inlens SE Detector with BSE Detector Option -Accelerating Voltage up to 30kV -20 MHz Digital Pattern Generator -Stitching and Overlay Accuracy about 35nmOEM Model Description
The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.Documents
No documents
RAITH
150 TWO
CATEGORY
Lithography
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Idle
Product ID:
114027
Wafer Sizes:
6"/150mm
Vintage:
2013
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
-Low kV Exposure and Imaging with Inlens SE Detector with BSE Detector Option -Accelerating Voltage up to 30kV -20 MHz Digital Pattern Generator -Stitching and Overlay Accuracy about 35nmOEM Model Description
The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.Documents
No documents