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Description
StepperConfiguration
No ConfigurationOEM Model Description
Resolution: ≦ 2.4 µm (isolated pattern), ≦ 3 µm (L/S) Projection magnification: 1:1.25 Exposure field: 120 mm square to 98.78 (H) × 138 (V) mm (≦ ø169.71 mm) Reticle size: 6-in. (0.25-in. thickness) Maximum plate size: 550 × 650 mm Overlay: ≦ 0.5 µm (EGA, |M| + 3σ)Documents
No documents
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
61726
Wafer Sizes:
Unknown
Vintage:
1999
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
NIKON
FX-601F
CATEGORY
Lithography
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
61726
Wafer Sizes:
Unknown
Vintage:
1999
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
StepperConfiguration
No ConfigurationOEM Model Description
Resolution: ≦ 2.4 µm (isolated pattern), ≦ 3 µm (L/S) Projection magnification: 1:1.25 Exposure field: 120 mm square to 98.78 (H) × 138 (V) mm (≦ ø169.71 mm) Reticle size: 6-in. (0.25-in. thickness) Maximum plate size: 550 × 650 mm Overlay: ≦ 0.5 µm (EGA, |M| + 3σ)Documents
No documents