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HITACHI HL-7000M
    Description
    HL7000M
    Configuration
    6" RETICLE MASK LINE
    OEM Model Description
    Hitachi developed the electron beam mask writer HL-7000M for 90nm node reticle production. New technologies, such as a novel electron beam optical column, a 1-nm address grid and improved proximity effect correction are used in the system. It has two electrostatic deflectors, a 50-kV electron gun and a maximum beam size of 2 µm ×2 µm. It can emit up to a current density of 20 A/cm2. The writing strategy uses a variable shaped beam, vector scanning and continuous stage moving exposure. To comply with high volume data, it can accept a hierarchy data format which can effectively be compressed into a small file. The new storage area network (SAN) we adopted achieves high-speed data transfer and does not need a high-volume disc system.
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    HITACHI

    HL-7000M

    verified-listing-icon

    Verified

    CATEGORY

    Lithography
    Last Verified: Over 30 days ago
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    100367


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown

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    HITACHI HL-7000M
    HITACHIHL-7000MLithography
    Vintage: 0Condition: Used
    Last Verified25 days ago

    HITACHI

    HL-7000M

    verified-listing-icon

    Verified

    CATEGORY

    Lithography
    Last Verified: Over 30 days ago
    listing-photo-6b855dc4106e4c4b88adb0aeb8b13e1b-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    100367


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    HL7000M
    Configuration
    6" RETICLE MASK LINE
    OEM Model Description
    Hitachi developed the electron beam mask writer HL-7000M for 90nm node reticle production. New technologies, such as a novel electron beam optical column, a 1-nm address grid and improved proximity effect correction are used in the system. It has two electrostatic deflectors, a 50-kV electron gun and a maximum beam size of 2 µm ×2 µm. It can emit up to a current density of 20 A/cm2. The writing strategy uses a variable shaped beam, vector scanning and continuous stage moving exposure. To comply with high volume data, it can accept a hierarchy data format which can effectively be compressed into a small file. The new storage area network (SAN) we adopted achieves high-speed data transfer and does not need a high-volume disc system.
    Documents

    No documents

    Similar Listings
    View All
    HITACHI HL-7000M
    HITACHI
    HL-7000M
    LithographyVintage: 0Condition: UsedLast Verified: 25 days ago
    HITACHI HL-7000M
    HITACHI
    HL-7000M
    LithographyVintage: 0Condition: UsedLast Verified: Over 60 days ago