Description

A compact device that utilizes the natural vaporization of HF to perform VPD on the oxide and nitride films on the silicon wafer, making the wafer surface hydrophobic. PTFE and PVDF are used in areas where the acid solution and acid atmosphere come into contact. The VPDBOX-300-5M can process up to 5 wafers at a time, ranging in size from 4 inches to 12 inches. This product is recommended for use in conjunction with the SC Series and should be installed in a clean fume hood. This is a brand-new unit. The price displayed on the website is for a package order that includes the SC. The price for this product when ordered separately is $23,800 (without on-site installation) or $32,100 (with on-site installation). This product will be shipped within one month of receiving the order and payment. Please note that the product price is subject to fluctuations in the yen-dollar exchange rate.

Configuration

Device Name: VPDBOX-300-5M Maximum Number of Wafers to be Processed: 5SH Wafer Size: 4″- 12″ Size(WxDxH)(※1): 410mmx405mmx410mm Weight: 15Kg Recommended Environment: Inside Clean Draft Utilities: N2 (for Acid Atmosphere Purging) ※1：Does not include protrusions.