Description
Tool is crated and was in working condition prior to shutdown.Configuration
Extraction PS: Glassmann with External Stack Accel HV: Glassmann Diffusion Pump: 1 x Varian Pump Cryo Pumps: 3 x CT8 Oil Pumps: 3 x 2012 Varian Incoming CDA Pressure: 100PSI N2 Pressure: 20 PSI Toxic MFC controlled system fully operational: 3 nos. Toxic MFC controlled system faulty: 1 No. Main Incoming Power: 208VAC/32KvaOEM Model Description
The 300 XP evolved from the industry-standard Varian 350D medium current implanter, which was the tool of choice during the early 1980's. The 300 XP was introduced in 1986 with process recipe control that assured error-free setups, independent dual end stations with increased reliability and throughput, and improved dosimetry.Documents
No documents
CATEGORY
Ion Implantation
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
108396
Wafer Sizes:
6"/150mm
Vintage:
1995
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT) / VARIAN
300XP
CATEGORY
Ion Implantation
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
108396
Wafer Sizes:
6"/150mm
Vintage:
1995
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Tool is crated and was in working condition prior to shutdown.Configuration
Extraction PS: Glassmann with External Stack Accel HV: Glassmann Diffusion Pump: 1 x Varian Pump Cryo Pumps: 3 x CT8 Oil Pumps: 3 x 2012 Varian Incoming CDA Pressure: 100PSI N2 Pressure: 20 PSI Toxic MFC controlled system fully operational: 3 nos. Toxic MFC controlled system faulty: 1 No. Main Incoming Power: 208VAC/32KvaOEM Model Description
The 300 XP evolved from the industry-standard Varian 350D medium current implanter, which was the tool of choice during the early 1980's. The 300 XP was introduced in 1986 with process recipe control that assured error-free setups, independent dual end stations with increased reliability and throughput, and improved dosimetry.Documents
No documents