Description
Ion Milling System / Ion Beam EtcherConfiguration
- Ion source: 35 cm diameter. - Includes a Hiden Mass Spectrometer end-point detector. - Has 2 x Ar lines. One goes to the plasma chamber, and the other goes to the chamber through the neutralizer. - For loading substrates, there is a loadlock - The substrate is fixed to the holder using a mechanical clamp - The holder has He backside cooling. - The holder is also water cooled. - The system has Eu CE Marking - The system has EU voltage setupOEM Model Description
The Ionfab 300 Plus from Oxford Instruments is a tool that uses ion beam technology for etching and deposition. It is part of the Ionfab 300 series and is designed to be versatile for multiple applications. The system has several hardware options, including open load, single substrate load lock, and cassette to cassette. It can also be configured to work with other plasma etch and deposition tools, either with a single wafer loadlock or cluster wafer handling. The Ionfab 300 Plus has several modes of operation, including ion beam etching (IBE), reactive ion beam etching (RIBE), chemically assisted ion beam etching (CAIBE), reactive ion beam deposition (RIBD), ion beam sputter deposition (IBSD), and ion assisted sputter deposition (IASD)Documents
No documents
Verified
CATEGORY
Ion Beam / IBD
Last Verified: 4 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
148400
Wafer Sizes:
6"/150mm
Vintage:
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
OXFORD
IONFAB 300 PLUS
CATEGORY
Ion Beam / IBD
Last Verified: 4 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
148400
Wafer Sizes:
6"/150mm
Vintage:
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Ion Milling System / Ion Beam EtcherConfiguration
- Ion source: 35 cm diameter. - Includes a Hiden Mass Spectrometer end-point detector. - Has 2 x Ar lines. One goes to the plasma chamber, and the other goes to the chamber through the neutralizer. - For loading substrates, there is a loadlock - The substrate is fixed to the holder using a mechanical clamp - The holder has He backside cooling. - The holder is also water cooled. - The system has Eu CE Marking - The system has EU voltage setupOEM Model Description
The Ionfab 300 Plus from Oxford Instruments is a tool that uses ion beam technology for etching and deposition. It is part of the Ionfab 300 series and is designed to be versatile for multiple applications. The system has several hardware options, including open load, single substrate load lock, and cassette to cassette. It can also be configured to work with other plasma etch and deposition tools, either with a single wafer loadlock or cluster wafer handling. The Ionfab 300 Plus has several modes of operation, including ion beam etching (IBE), reactive ion beam etching (RIBE), chemically assisted ion beam etching (CAIBE), reactive ion beam deposition (RIBD), ion beam sputter deposition (IBSD), and ion assisted sputter deposition (IASD)Documents
No documents