Description
VCR Group IBS TM200S ion beam sputtering system is useful for SEM and TEM sample preparation. The IBS/TM200 Ion beam sputter-coating device is equipped with a 200 l/s turbo-molecular pump, an ion-beam gun, a quartz crystal thickness monitor, a four-position target carrier, and a liquid nitrogen cold trap.Configuration
System specifications: Electrical: Interlocked to prevent high voltage shock 110 V AC, 50/ 60 Hz, 15 A 220 V AC, 50/ 60 Hz, 10 A (Optional) Mechanical: Weight: < 500 lbs Size: Approximate overall dimensions 50” H x 24” W x 32” D (chamber lid open) 40” H x 24” W x 32” D (chamber lid closed) Utilities: Argon Gas Flow: 5-10 psi, 1.5 sccm, 99.999 % pure Nitrogen Gas Flow: Turbomolecular Pump bleed Water Flow: 30 GPH, clean waterOEM Model Description
The IBS TM200S is an ion beam sputtering system manufactured by VCR Group. It is designed to deposit ultra-fine grain conductive films of metals or carbon onto sample surfaces, making it particularly useful for preparing samples for scanning electron microscopy (SEM) and transmission electron microscopy (TEM).Documents
No documents
IBS
TM200S
CATEGORY
Ion Beam / IBD
Last Verified: 10 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
17433
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
VCR Group IBS TM200S ion beam sputtering system is useful for SEM and TEM sample preparation. The IBS/TM200 Ion beam sputter-coating device is equipped with a 200 l/s turbo-molecular pump, an ion-beam gun, a quartz crystal thickness monitor, a four-position target carrier, and a liquid nitrogen cold trap.Configuration
System specifications: Electrical: Interlocked to prevent high voltage shock 110 V AC, 50/ 60 Hz, 15 A 220 V AC, 50/ 60 Hz, 10 A (Optional) Mechanical: Weight: < 500 lbs Size: Approximate overall dimensions 50” H x 24” W x 32” D (chamber lid open) 40” H x 24” W x 32” D (chamber lid closed) Utilities: Argon Gas Flow: 5-10 psi, 1.5 sccm, 99.999 % pure Nitrogen Gas Flow: Turbomolecular Pump bleed Water Flow: 30 GPH, clean waterOEM Model Description
The IBS TM200S is an ion beam sputtering system manufactured by VCR Group. It is designed to deposit ultra-fine grain conductive films of metals or carbon onto sample surfaces, making it particularly useful for preparing samples for scanning electron microscopy (SEM) and transmission electron microscopy (TEM).Documents
No documents