Overview

Tandetron 1520 and Genus 1510. Introduced in 1995 and 1992, respectively, the Tandetron 1520 and Genus 1510 were Genus' previous generation MeV ion implant products. The use of the high energy (MeV) implantation process has been expanded into mass semiconductor production lines in the past couple of years mainly for process simplification and associated cost reduction. In order to meet this requirement, Genus Inc. has introduced its third generation high energy ion implanter "Tandetron 1520" with a significantly reduced system foot print compared to its predecessors, the Genus G1500 and the G1510 MeV implanters.