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AXCELIS NV 10 160
    Description
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    Configuration
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    OEM Model Description
    The AXCELIS NV 10-160 is a high-energy ion implanter, specifically designed for implanting ions into bare silicon wafers. It operates at 60 keV energy, and its implantation process allows for precise dosing in the range of 1 to 5∙10^15 ions per square centimeter. After implantation, the wafers can be annealed at 600°C for 20 minutes to activate and optimize the implanted ions' performance. The AXCELIS NV 10-160 is a powerful tool used in semiconductor manufacturing for creating controlled doping profiles and modifying material properties in silicon wafers, essential for producing advanced semiconductor devices.
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    AXCELIS

    NV 10 160

    verified-listing-icon

    Verified

    CATEGORY
    High Energy

    Last Verified: Over 60 days ago

    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    79658

    Wafer Sizes:

    6"/150mm

    Vintage:

    Unknown

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    AXCELIS NV 10 160

    AXCELIS

    NV 10 160

    High Energy
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    AXCELIS

    NV 10 160

    verified-listing-icon
    Verified
    CATEGORY
    High Energy
    Last Verified: Over 60 days ago
    listing-photo-141421a38e694c06aefcb21d398103b5-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    79658

    Wafer Sizes:

    6"/150mm

    Vintage:

    Unknown

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The AXCELIS NV 10-160 is a high-energy ion implanter, specifically designed for implanting ions into bare silicon wafers. It operates at 60 keV energy, and its implantation process allows for precise dosing in the range of 1 to 5∙10^15 ions per square centimeter. After implantation, the wafers can be annealed at 600°C for 20 minutes to activate and optimize the implanted ions' performance. The AXCELIS NV 10-160 is a powerful tool used in semiconductor manufacturing for creating controlled doping profiles and modifying material properties in silicon wafers, essential for producing advanced semiconductor devices.
    Documents

    No documents

    Similar Listings
    View All
    AXCELIS NV 10 160

    AXCELIS

    NV 10 160

    High EnergyVintage: 0Condition: UsedLast Verified: Over 60 days ago