Description
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The VIISion 80 ion implanter beam line incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass defining slit, a variable gap acceleration system and a full faraday in front of the wafer.Documents
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APPLIED MATERIALS (AMAT) / VARIAN
VIISion 80
Verified
CATEGORY
High Current
Last Verified: 23 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
118048
Wafer Sizes:
Unknown
Vintage:
Unknown
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APPLIED MATERIALS (AMAT) / VARIAN
VIISion 80
CATEGORY
High Current
Last Verified: 23 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
118048
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The VIISion 80 ion implanter beam line incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass defining slit, a variable gap acceleration system and a full faraday in front of the wafer.Documents
No documents