EATON NOVA / AXCELIS GSD 200 E2 is high current ion implanter that is configured for 200mm nodes with 13 batch wafers. It has 4 Cassette table (280 mm),2 Load buffer and 1 Dummy buffer. The input Power is 208 V, 60 Hz, 3 Phase, 95 A, 35 KVA and Output power is 90 KeV, 20 mA. Its vaccum system specifications are: A2203C, SEIKO SEIKI P1 Source turbo; STP-A2203C, SEIKO SEIKI P1 Controller; CTI OB-8 P2/Beamguide Cyro pump. Its other configurations include: 2 Ground bars; CTI_CRYOGENICS, 9650 compressor.

In 2000, Eaton spun off Axcelis as a separate company, and Axcelis inherited Eaton’s 50-percent ownership stake in the joint venture. SEN, licenses technology from Axcelis for ion implantation, has exclusive rights to the territory of Japan and is the leading producer of ion implantation equipment in Japan. In 2009, the merger between Axcelis Technologies and Sumitomo Heavy Industries dissolved—Sumitomo became the sole parent company, and with this, the company name changed to SEN Corporation. 

NV GSD 200E2

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