Description
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: TEL Waves Equipment status: Out of Fab Type: Diffusion Air valve: FUJIKIN MFC, MFM: HORIBA STEC Three phase power: 3Ø AC 440V Single phase power: 1Ø AC 208V Main/APC: CKD GAS: HF, O2, O3, PN2, LTO520 Others: KAWASAKI MECHAConfiguration
INDY PLUS-B-M Process: ALD (SiO2) The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Temperature controller - Scavenger - Cooling water unit The gas subsystem includes the following major components: - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM Model Description
TELINDY PLUS™ is a cutting-edge thermal processing technology that combines the best features of the TELFORMULA™ minibatch system and the previous generation TELINDY™ platform. It offers improved process performance and productivity, with new enhancements such as improved maintenance access, dry gas chamber cleaning, and low O2 environment loading area control. These features contribute to yield increases by managing small particles more effectively. The highest levels of productivity are achieved by combining a 125 wafer load size with TEL’s FTPS™ responsive heater and a dual boat system option. TELINDY PLUS™ can be used for a wide range of applications, from traditional silicon treatments to leading edge ALD processes and radical oxidation. It represents the convergence of demonstrated experience and advanced technology, making it a powerful tool for thermal processing.Documents
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TEL / TOKYO ELECTRON
TELINDY PLUS
Verified
CATEGORY
Furnaces / Diffusion
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
72832
Wafer Sizes:
12"/300mm
Vintage:
2013
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View AllTEL / TOKYO ELECTRON
TELINDY PLUS
CATEGORY
Furnaces / Diffusion
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
72832
Wafer Sizes:
12"/300mm
Vintage:
2013
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: TEL Waves Equipment status: Out of Fab Type: Diffusion Air valve: FUJIKIN MFC, MFM: HORIBA STEC Three phase power: 3Ø AC 440V Single phase power: 1Ø AC 208V Main/APC: CKD GAS: HF, O2, O3, PN2, LTO520 Others: KAWASAKI MECHAConfiguration
INDY PLUS-B-M Process: ALD (SiO2) The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Temperature controller - Scavenger - Cooling water unit The gas subsystem includes the following major components: - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM Model Description
TELINDY PLUS™ is a cutting-edge thermal processing technology that combines the best features of the TELFORMULA™ minibatch system and the previous generation TELINDY™ platform. It offers improved process performance and productivity, with new enhancements such as improved maintenance access, dry gas chamber cleaning, and low O2 environment loading area control. These features contribute to yield increases by managing small particles more effectively. The highest levels of productivity are achieved by combining a 125 wafer load size with TEL’s FTPS™ responsive heater and a dual boat system option. TELINDY PLUS™ can be used for a wide range of applications, from traditional silicon treatments to leading edge ALD processes and radical oxidation. It represents the convergence of demonstrated experience and advanced technology, making it a powerful tool for thermal processing.Documents
No documents