Description
dry oxidation at temperatures between 700 -1150°C. Batches of up to 50 wafers (4 to 6”) low pressure chemical vapor deposition (LPCVD) tool used for silicon nitride deposition at temperature between 700-850°C with batches of up to 50 wafers (4 to 6”)Configuration
MRL Cyclone 630 Configured: 4 to 6" Tube 1: LPCVD Silicon Nitride, used for silicon nitride deposition at temperatures between 700-850°C Tube 2: Dry Oxidation at temperatures between 700 -1150°C Tube 3: N/A Tube 4: N/AOEM Model Description
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MRL
Cyclone 630
Verified
CATEGORY
Furnaces / Diffusion
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
111178
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
MRL
Cyclone 630
CATEGORY
Furnaces / Diffusion
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
111178
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
dry oxidation at temperatures between 700 -1150°C. Batches of up to 50 wafers (4 to 6”) low pressure chemical vapor deposition (LPCVD) tool used for silicon nitride deposition at temperature between 700-850°C with batches of up to 50 wafers (4 to 6”)Configuration
MRL Cyclone 630 Configured: 4 to 6" Tube 1: LPCVD Silicon Nitride, used for silicon nitride deposition at temperatures between 700-850°C Tube 2: Dry Oxidation at temperatures between 700 -1150°C Tube 3: N/A Tube 4: N/AOEM Model Description
None ProvidedDocuments
No documents