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ASM SONORA
  • ASM SONORA
  • ASM SONORA
  • ASM SONORA
Description
DIFF
Configuration
No Configuration
OEM Model Description
SONORA is a 300mm batch vertical furnace for logic/foundry and memory applications, as well as 300mm analog/power. SONORA is capable of both atmospheric and low-pressure thermal wafer processing. Atmospheric thermal applications include diffusion and activation of dopants, annealing to affect material properties by heating to a specific temperature, and oxidation to form silicon oxide. LPCVD applications include polysilicon, silicon nitride, and silicon oxide.
Documents

No documents

verified-listing-icon

Verified

CATEGORY
Furnaces / Diffusion

Last Verified: Over 30 days ago

Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

123754


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

ASM

SONORA

verified-listing-icon
Verified
CATEGORY
Furnaces / Diffusion
Last Verified: Over 30 days ago
listing-photo-1c38b4e5a0664794a5f079d5d97bc129-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

123754


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
DIFF
Configuration
No Configuration
OEM Model Description
SONORA is a 300mm batch vertical furnace for logic/foundry and memory applications, as well as 300mm analog/power. SONORA is capable of both atmospheric and low-pressure thermal wafer processing. Atmospheric thermal applications include diffusion and activation of dopants, annealing to affect material properties by heating to a specific temperature, and oxidation to form silicon oxide. LPCVD applications include polysilicon, silicon nitride, and silicon oxide.
Documents

No documents