The FEI FIB 800 is a state-of-the-art Focused Ion Beam (FIB) system that is utilized for a variety of applications, including circuit editing, defect and failure analysis, TEM lamella preparation, nanofabrication, nanoprototyping, and MEMS. It employs a Magnum ion column and boasts a milling power of 21nA beam current. The system can accommodate samples with diameters up to 200mm and features a 5-axis motorized eucentric tilt stage. Additionally, it includes a gas injection system with up to four injectors and a vacuum system with column IGP, air-cooled Turbo, and mechanical PVP. 

Thermo Fisher Scientific Inc. (NYSE: TMO), the world leader in serving science, today announced that it has completed its acquisition of FEI Company, Inc. (NASDAQ: FEIC), the leader in high-performance electron microscopy. FEI and Philips joined their technologies in 1993 to create the first DualBeam (FIB/SEM) workstation.

THERMOFISHER SCIENTIFIC / FEI / PHILLIPS

FIB 800

The FEI FIB 200 is a type of Focused Ion Beam (FIB) system that has many uses, such as editing circuits, analyzing defects and failures, preparing TEM lamella, fabricating nanostructures, prototyping at the nanoscale, and working with MEMS. There are a few different models of the FEI FIB 200, including the FEI FIB 200-M and the FEI FIB 200-P. The FEI FIB 200-M model features a Magnum ion column that provides twice the milling power of earlier pre-lens FIB columns. It also has a voltage range of 5-30kV for its Magnum column, a beam current of 21nA for milling power, and CDEM for ion and electron imaging with a resolution of 7nm. The FEI FIB 200-P model, on the other hand, uses a pre-lens ion column.

FIB 200

OptiFIB-IV 

The FEI Strata DB 235 is a dual-beam system that combines the capabilities of a focused ion beam (FIB) and a scanning electron microscope (SEM). It features both a Hexalens electron column and a Magnum ion column, making it well-suited for failure analysis and high-end sample preparation. The SEM component uses a Schottkey emitter and operates at 200-300 kV, while the FIB component uses Gallium liquid metal and operates at 5 to 30 kV with a current range of 1pA to 20 nA. The system offers high resolution, with 3 nm for SEM and 7 nm for FIB. It is controlled by the Window NT system and can perform automated TEM sample preparation. An attached EDAX electron dispersive X-ray analysis system allows for chemical analysis. Additionally, the FIB/SEM has the unique ability to add or remove material with high spatial resolution between precisely defined locations.

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FIB 800

FIB 200

OptiFIB-IV

STRATA DB 235