1. For 2", 4", 6" LED patterned sapphire substrates, PSS mass-produced dry etching equipment.
2. Automation: 6-layer wafer chuck design to improve productivity
3. Expandable process chamber
4. Minimum plant area (Footprint) .

AST Juchang Technology has always been full of infinite ideals and enthusiasm for the optoelectronic semiconductor equipment industry.Thin film process: (1) E-Beam Evaporator (Electron Beam Evaporator), (2) Resistance Heating Evaporator (Resistance Heating Evaporator). Etching process: (1) TCP-RIE (High Density Plasma Reactive Ion Etching Equipment), (2) RIE (Reactive Ion Etching Equipment).

EP370-T

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