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KLA / SPTS MPX ICP PRO
    Description
    No description
    Configuration
    Configuration: - Model: MPX ICP PRO - Process Chamber: ASE-HRM - ASE-HRM chamber: High Rate Magnetic source achieves over three times the etch rates versus the original Bosch process - Process: High Rate Deep Silicon Etch - Operating software: Windows - Max wafer size capable: 200mm - Voltage: 208V 60Hz 3Ph Vacuum Load-lock For Single Chamber MPX systems (MESC): - Carousel Load Lock (200mm) - Chamber lid temperature control - Fully automatic transfer of substrates between the load-lock and the process chamber MPX ICP Process Chamber: - Production proven single wafer process chamber - Balun Coil for High Rate Etch - Turbo Pump - VAT Pendulum Valve - Backside Helium Cooling - Remote sealed extracted gas box with orbitally welded gas lines - Electronics cabinet - LCD flat panel monitor - Fully automatic multistep processing or manual operation - High Frequency RF Generator - Low Frequency RF Generator - Vacuum Pump (Load Lock) - Vacuum Pump (Chamber) - Chiller - System Cables (full set)
    OEM Model Description
    None Provided
    Documents

    No documents

    KLA / SPTS

    MPX ICP PRO

    verified-listing-icon

    Verified

    CATEGORY

    Etch/Asher
    Last Verified: 30 days ago
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    24522


    Wafer Sizes:

    8"/200mm


    Vintage:

    2003

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    KLA / SPTS

    MPX ICP PRO

    verified-listing-icon

    Verified

    CATEGORY

    Etch/Asher
    Last Verified: 30 days ago
    listing-photo-166dd5f6c4274e669d7393ab89d2d4cb-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1689/166dd5f6c4274e669d7393ab89d2d4cb/7d23a78fe19442b2946f1c9468f10536_screenshot20200813at5_m.png
    listing-photo-166dd5f6c4274e669d7393ab89d2d4cb-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1689/166dd5f6c4274e669d7393ab89d2d4cb/c8ed5543d3c7441d956f54f68ebcc989_screenshot20200813at5_m.png
    listing-photo-166dd5f6c4274e669d7393ab89d2d4cb-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1689/166dd5f6c4274e669d7393ab89d2d4cb/8136067dde374f7eada7e7f11faff852_screenshot20200813at5_m.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    24522


    Wafer Sizes:

    8"/200mm


    Vintage:

    2003


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    Configuration: - Model: MPX ICP PRO - Process Chamber: ASE-HRM - ASE-HRM chamber: High Rate Magnetic source achieves over three times the etch rates versus the original Bosch process - Process: High Rate Deep Silicon Etch - Operating software: Windows - Max wafer size capable: 200mm - Voltage: 208V 60Hz 3Ph Vacuum Load-lock For Single Chamber MPX systems (MESC): - Carousel Load Lock (200mm) - Chamber lid temperature control - Fully automatic transfer of substrates between the load-lock and the process chamber MPX ICP Process Chamber: - Production proven single wafer process chamber - Balun Coil for High Rate Etch - Turbo Pump - VAT Pendulum Valve - Backside Helium Cooling - Remote sealed extracted gas box with orbitally welded gas lines - Electronics cabinet - LCD flat panel monitor - Fully automatic multistep processing or manual operation - High Frequency RF Generator - Low Frequency RF Generator - Vacuum Pump (Load Lock) - Vacuum Pump (Chamber) - Chiller - System Cables (full set)
    OEM Model Description
    None Provided
    Documents

    No documents

    Similar Listings
    View All

    No Similar Listings