Description
No descriptionConfiguration
Configuration: - Model: MPX ICP PRO - Process Chamber: ASE-HRM - ASE-HRM chamber: High Rate Magnetic source achieves over three times the etch rates versus the original Bosch process - Process: High Rate Deep Silicon Etch - Operating software: Windows - Max wafer size capable: 200mm - Voltage: 208V 60Hz 3Ph Vacuum Load-lock For Single Chamber MPX systems (MESC): - Carousel Load Lock (200mm) - Chamber lid temperature control - Fully automatic transfer of substrates between the load-lock and the process chamber MPX ICP Process Chamber: - Production proven single wafer process chamber - Balun Coil for High Rate Etch - Turbo Pump - VAT Pendulum Valve - Backside Helium Cooling - Remote sealed extracted gas box with orbitally welded gas lines - Electronics cabinet - LCD flat panel monitor - Fully automatic multistep processing or manual operation - High Frequency RF Generator - Low Frequency RF Generator - Vacuum Pump (Load Lock) - Vacuum Pump (Chamber) - Chiller - System Cables (full set)OEM Model Description
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KLA / SPTS
MPX ICP PRO
Verified
CATEGORY
Etch/Asher
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
24522
Wafer Sizes:
8"/200mm
Vintage:
2003
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Logistics Support
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Money Back Guarantee
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Transaction Insured by Moov
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Refurbishment Services
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KLA / SPTS
MPX ICP PRO
Verified
CATEGORY
Etch/Asher
Last Verified: 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
24522
Wafer Sizes:
8"/200mm
Vintage:
2003
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Configuration: - Model: MPX ICP PRO - Process Chamber: ASE-HRM - ASE-HRM chamber: High Rate Magnetic source achieves over three times the etch rates versus the original Bosch process - Process: High Rate Deep Silicon Etch - Operating software: Windows - Max wafer size capable: 200mm - Voltage: 208V 60Hz 3Ph Vacuum Load-lock For Single Chamber MPX systems (MESC): - Carousel Load Lock (200mm) - Chamber lid temperature control - Fully automatic transfer of substrates between the load-lock and the process chamber MPX ICP Process Chamber: - Production proven single wafer process chamber - Balun Coil for High Rate Etch - Turbo Pump - VAT Pendulum Valve - Backside Helium Cooling - Remote sealed extracted gas box with orbitally welded gas lines - Electronics cabinet - LCD flat panel monitor - Fully automatic multistep processing or manual operation - High Frequency RF Generator - Low Frequency RF Generator - Vacuum Pump (Load Lock) - Vacuum Pump (Chamber) - Chiller - System Cables (full set)OEM Model Description
None ProvidedDocuments
No documents
Similar Listings
View AllNo Similar Listings