Description

The NanoQuest I ion beam etching system is the ideal platform for etching single wafer substrates up to 4”. With a high cooling substrate stage, the system can etch through photo resist or masks to produce patterned substrates on any material. Technical Features: • Housed in compact one-piece frame with integral electronics rack to minimize lab space. • High vacuum design principles for quick cycle times and low ultimate pressure performance. • UHP Gas distribution ensures stable ion source operation. • Stainless steel frame with integral instrument rack, housing a touch screen LabView interface to PLC controller. • Completely automated; o pump down, o gas flow control, o ion source operation for repeatable and reliable etching of substrates. Condition:Not in full working condition Missing Components: 3 units of backing pumps (ACP15) & SIMs probe and controller

Configuration

Ion Beam Etching System Chiller Model: Thermo Flex 1400 Chiller Model: Thermo Flex 1400 Power Magnetics Model: BC30G1-M/Z Diaphragm Vacuum Pump Adm 1 Model: 305230 Refurbished Pump Technical Features: • Ion milling system consisting of 1 etching chamber and load-lock. • Argon-based etching by physical ion bombardment etch equipped with in-situ SIMS endpoint detection technique. • Capable of angled etching for profile control. Specifications: • Materials for etching: Metal, dielectric, MRAM magnetic layers, hard-to-etch materials. • Gases for use: Ar • Endpoint Detection: Yes • Etch Uniformity: <5%