Description
MainframeConfiguration
(Qty 4) Chambers Process: Anisotrop Procedure: CUBVOEM Model Description
The Applied Materials Centura HART Etch System is a 200mm multi-chamber semiconductor processing platform designed primarily for high-aspect-ratio trench (HART) etching.Documents
No documents
CATEGORY
Etch/Asher
Last Verified: 18 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
148016
Wafer Sizes:
8"/200mm
Vintage:
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA HART
CATEGORY
Etch/Asher
Last Verified: 18 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
148016
Wafer Sizes:
8"/200mm
Vintage:
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
MainframeConfiguration
(Qty 4) Chambers Process: Anisotrop Procedure: CUBVOEM Model Description
The Applied Materials Centura HART Etch System is a 200mm multi-chamber semiconductor processing platform designed primarily for high-aspect-ratio trench (HART) etching.Documents
No documents