P5000 ETCH
Category
Etch/AsherOverview
The AMAT P5000 Etch is a magnetically enhanced reactive ion etching system (MERIE) with two functional process chambers (Chambers B & C). P5000 Chamber B is primarily used for etching silicon based dielectrics (silicon dioxide, silcon nitride, etc.) and some carbon based compounds (resist, poly imide, etc) while chamber C is mainly used for silicon etching with high selectivity to underlying dielectric such as silicon dioxide. The system can process only 4" wafers. Pieces have to be attached to a 4" wafer. Though the process chamber processes one wafer at a time, up to 25 wafers can be loaded per batch.
Active Listings
48
Services
Inspection, Insurance, Appraisal, Logistics
APPLIED MATERIALS (AMAT)
P5000 ETCH
Etch/AsherVintage: 1996Condition: UsedLast VerifiedOver 60 days agoAPPLIED MATERIALS (AMAT)
P5000 ETCH
Etch/AsherVintage: Condition: UsedLast VerifiedOver 60 days agoAPPLIED MATERIALS (AMAT)
P5000 ETCH
Etch/AsherVintage: 1997Condition: UsedLast VerifiedOver 60 days agoAPPLIED MATERIALS (AMAT)
P5000 ETCH
Etch/AsherVintage: 1995Condition: UsedLast VerifiedOver 60 days ago
APPLIED MATERIALS (AMAT)
P5000 ETCH
Etch/AsherVintage: 1995Condition: UsedLast VerifiedOver 60 days agoAPPLIED MATERIALS (AMAT)
P5000 ETCH
Etch/AsherVintage: Condition: UsedLast VerifiedOver 60 days agoAPPLIED MATERIALS (AMAT)
P5000 ETCH
Etch/AsherVintage: 1992Condition: UsedLast VerifiedOver 60 days agoAPPLIED MATERIALS (AMAT)
P5000 ETCH
Etch/AsherVintage: 2000Condition: RefurbishedLast VerifiedOver 60 days ago