The AW-303R is an electromechanical production system used to etch materials such as nitride, oxide, polysilicon,etc. from the surface of silicon or other substrates. Each wafer is processed individually by means of a chemical reaction induced by a gas plasma.The AW-303R is an automated single wafer tool designed as a flexible 13.56MHz RF downstream plasma etch system for high-volume wafer fabrication. The AW-303R is in direct response to manufacturer’s concerns for wafer uniformity, uptime, reliability and production-proven technology. 

Allwin21 Corp. is the exclusive licensed manufacturer of AG Associates Heatpulse 610 Rapid Thermal Process tool. Manufacturing the new AccuThermo AW Series Atmospheric and Vacuum Rapid Thermal Processors. Compared with traditional RTP systems, Allwin21’s AccuThermo AW RTPs have innovative software and more advanced temperature control technologies to achieve the BEST rapid thermal processing performance (repeatability, uniformity, and stability) with decades of research directly applicable to ours. Focus on extending product lifecycle, providing solutions, and engineering enhancements to many production-proven semiconductor process equipment as well- most directly related to Si and III-V processing. These platforms of OEM semiconductor equipment have been used in Si and III-V production and R&D since the 1990′s. They have proven processes and research. Allwin21 Corp. can customize these OEM systems with Allwin21′s comparable integrated process control system with PC, solid robotic wafer transfer system, and new critical components. This is to achieve the goal of giving our customers a production edge, with right cost, and without having to worry about obsolete parts.

AW-303R

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