Description
Sputter-up method High-frequency magnetron discharge Target distance 40 to 40 mm Holder 3 Number of substrates mounted 4 Maximum heating temperature 300°C Chamber dimensions φ450x220H Substrate holder dimensions φ350Configuration
No ConfigurationOEM Model Description
Sputtering systemDocuments
No documents
SHIMADZU
HSR-521A
Verified
CATEGORY
Electronic Test
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
71025
Wafer Sizes:
Unknown
Vintage:
1991
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SHIMADZU
HSR-521A
CATEGORY
Electronic Test
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
71025
Wafer Sizes:
Unknown
Vintage:
1991
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Sputter-up method High-frequency magnetron discharge Target distance 40 to 40 mm Holder 3 Number of substrates mounted 4 Maximum heating temperature 300°C Chamber dimensions φ450x220H Substrate holder dimensions φ350Configuration
No ConfigurationOEM Model Description
Sputtering systemDocuments
No documents