(1) EFEM 
(1) HPK1021-TE2
(3) Shin Chamber 
(3) RF Generator AGA-50B 
(3) DGP-120A2 
(3) RF Pump Box 
(3) TMP controller EI-4203MZ 
(3) Gas Box

TEL / TOKYO ELECTRON

Telius-SP is a high-performance etching system designed for large diameter (300 mm) requirements. It is part of the Telius platform and offers improved productivity through increased throughput, a reduced footprint, and higher energy efficiency. The system can be fitted with various chamber applications, including DRM and SCCM chambers, to support a wide range of process areas. It can support up to 4 chambers and boasts a high throughput, compact design, and low cost of ownership (CoO). Additionally, the system is designed for ease of maintenance. Overall, Telius-SP is a versatile and cost-effective solution for large diameter etching needs.

TEL / TOKYO ELECTRON

TELIUS SP 305 SCCM

Dry / Plasma Etch

Similar Listings

TEL / TOKYO ELECTRON

TELIUS SP 305 SCCM

TELIUS SP 305 SCCM

Dry / Plasma Etch

Similar Listings

TEL / TOKYO ELECTRON

TELIUS SP 305 SCCM