Skip to main content
6" Fab For Sale from Moov - Click Here to Learn More
6" Fab For Sale from Moov - Click Here to Learn More
Moov logo

6" Fab For Sale from Moov - Click Here to Learn More
Moov Icon
TEL / TOKYO ELECTRON TELIUS SP 305 SCCM
    Description
    Telius SP 305 SCCM Dielectric Etch Process Oxide Oxide Etch (3) Shin Chamber (6) EMO Front 3ea, Rear (3) RF Generator TOP (3) RF Generator BTM (3) RF Matcher TOP (3) RF Matcher BTM (12) Gas Line
    Configuration
    No Configuration
    OEM Model Description
    Telius-SP is a high-performance etching system designed for large diameter (300 mm) requirements. It is part of the Telius platform and offers improved productivity through increased throughput, a reduced footprint, and higher energy efficiency. The system can be fitted with various chamber applications, including DRM and SCCM chambers, to support a wide range of process areas. It can support up to 4 chambers and boasts a high throughput, compact design, and low cost of ownership (CoO). Additionally, the system is designed for ease of maintenance. Overall, Telius-SP is a versatile and cost-effective solution for large diameter etching needs.
    Documents

    TEL / TOKYO ELECTRON

    TELIUS SP 305 SCCM

    verified-listing-icon

    Verified

    CATEGORY
    Dry / Plasma Etch

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    81928


    Wafer Sizes:

    12"/300mm


    Vintage:

    2004


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    TEL / TOKYO ELECTRON TELIUS SP 305 SCCM

    TEL / TOKYO ELECTRON

    TELIUS SP 305 SCCM

    Dry / Plasma Etch
    Vintage: 2008Condition: Used
    Last VerifiedOver 60 days ago

    TEL / TOKYO ELECTRON

    TELIUS SP 305 SCCM

    verified-listing-icon
    Verified
    CATEGORY
    Dry / Plasma Etch
    Last Verified: Over 60 days ago
    listing-photo-2b4430dac1b04f70ba5da399399bf179-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    81928


    Wafer Sizes:

    12"/300mm


    Vintage:

    2004


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Telius SP 305 SCCM Dielectric Etch Process Oxide Oxide Etch (3) Shin Chamber (6) EMO Front 3ea, Rear (3) RF Generator TOP (3) RF Generator BTM (3) RF Matcher TOP (3) RF Matcher BTM (12) Gas Line
    Configuration
    No Configuration
    OEM Model Description
    Telius-SP is a high-performance etching system designed for large diameter (300 mm) requirements. It is part of the Telius platform and offers improved productivity through increased throughput, a reduced footprint, and higher energy efficiency. The system can be fitted with various chamber applications, including DRM and SCCM chambers, to support a wide range of process areas. It can support up to 4 chambers and boasts a high throughput, compact design, and low cost of ownership (CoO). Additionally, the system is designed for ease of maintenance. Overall, Telius-SP is a versatile and cost-effective solution for large diameter etching needs.
    Documents
    Similar Listings
    View All
    TEL / TOKYO ELECTRON TELIUS SP 305 SCCM

    TEL / TOKYO ELECTRON

    TELIUS SP 305 SCCM

    Dry / Plasma EtchVintage: 2008Condition: UsedLast Verified:Over 60 days ago
    TEL / TOKYO ELECTRON TELIUS SP 305 SCCM

    TEL / TOKYO ELECTRON

    TELIUS SP 305 SCCM

    Dry / Plasma EtchVintage: 2004Condition: UsedLast Verified:Over 60 days ago
    TEL / TOKYO ELECTRON TELIUS SP 305 SCCM

    TEL / TOKYO ELECTRON

    TELIUS SP 305 SCCM

    Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days ago