Skip to main content
6" Fab For Sale from Moov - Click Here to Learn More
6" Fab For Sale from Moov - Click Here to Learn More
Moov logo
6" Fab For Sale from Moov - Click Here to Learn More
Moov Icon
STS HRM
    Description
    No description
    Configuration
    -Materials Etched: Si, SOI wafers -Masks: SiO2, SiN -Gases: SF6, C4F8, Ar, O2, Co2 -Photoresists: SC1800 series& SPR220 (Shipley), AZ4000 series (Clariant), NPR (Futurex) -Temp range: -20C to 100C Windows 2000 PC Note: pumps not included
    OEM Model Description
    With market leading etch rates using a conventional de-coupled plasma source, the HRM provides a cost effective Deep Reactive lon Etch (DRIE) processing chamber. Designed to offer high etch rates while controlling ion damage, the HRM is ideal for deep anisotropic silicon etching using STS' ASE® process technology.
    Documents

    No documents

    STS

    HRM

    verified-listing-icon

    Verified

    CATEGORY
    Dry / Plasma Etch

    Last Verified: Over 60 days ago

    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    110058

    Wafer Sizes:

    6"/150mm

    Vintage:

    2003

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    STS HRM

    STS

    HRM

    Dry / Plasma Etch
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago
    STS HRM

    STS

    HRM

    Dry / Plasma Etch
    Vintage: 2003Condition: Used
    Last VerifiedOver 60 days ago

    STS

    HRM

    verified-listing-icon
    Verified
    CATEGORY
    Dry / Plasma Etch
    Last Verified: Over 60 days ago
    listing-photo-c3dd3833cc484dba9ffb1bda6d60dad3-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/76003/c3dd3833cc484dba9ffb1bda6d60dad3/ccd10c223526478abe3eb8b40e1081cd_c8be21fc85a94afca7c0e337bca687e71201a_mw.jpeg
    listing-photo-c3dd3833cc484dba9ffb1bda6d60dad3-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/76003/c3dd3833cc484dba9ffb1bda6d60dad3/570ffbea3bb94abf807ad07ec8af71e4_5670c357443b418ba3f25146e1d7145e1201a_mw.jpeg
    listing-photo-c3dd3833cc484dba9ffb1bda6d60dad3-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/76003/c3dd3833cc484dba9ffb1bda6d60dad3/91ae0a6ee78b4a9b86e7fc0bb37dc73c_c17427de568c499c9402a3c143dbb89a_mw.jpeg
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    110058

    Wafer Sizes:

    6"/150mm

    Vintage:

    2003

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    -Materials Etched: Si, SOI wafers -Masks: SiO2, SiN -Gases: SF6, C4F8, Ar, O2, Co2 -Photoresists: SC1800 series& SPR220 (Shipley), AZ4000 series (Clariant), NPR (Futurex) -Temp range: -20C to 100C Windows 2000 PC Note: pumps not included
    OEM Model Description
    With market leading etch rates using a conventional de-coupled plasma source, the HRM provides a cost effective Deep Reactive lon Etch (DRIE) processing chamber. Designed to offer high etch rates while controlling ion damage, the HRM is ideal for deep anisotropic silicon etching using STS' ASE® process technology.
    Documents

    No documents

    Similar Listings
    View All
    STS HRM

    STS

    HRM

    Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days ago
    STS HRM

    STS

    HRM

    Dry / Plasma EtchVintage: 2003Condition: UsedLast Verified:Over 60 days ago