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6" Fab For Sale from Moov - Click Here to Learn More
6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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PANASONIC E600L
    Description
    ICP system
    Configuration
    No Configuration
    OEM Model Description
    Plasma Source: ICP Plasma Process Gas: 2Lines (standard) *Maximum 6 Lines (e.g. Chlorinated Gas, Fluoride Gas, Ar, O2, He ) Applicable Wafer: ø100 mm wafer with orientation flat (standard) *Option : ø50 mm, ø75 mm, ø50 mm (with O.F.) Wafer Material: Silicon (standard) *Option : Quartz, GaAs, Sapphire Machine Dimensions / Weight*1: W 1170 mm × D 2650 mm, H 2100 mm / 1900 kg (Main body only) Power Source*2: Single phase AC 200V, 6 kVA and Three-phase AC 200V, 15 kVA (Main body only) Dry Air: 0.49 M Pa to 0.54 M Pa, 40 L / min [A.N.R.] N 2Source: 0.5 M Pa to 0.7 M Pa, 50 L / min
    Documents

    No documents

    PANASONIC

    E600L

    verified-listing-icon

    Verified

    CATEGORY
    Dry / Plasma Etch

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Refurbished


    Operational Status:

    Unknown


    Product ID:

    114506


    Wafer Sizes:

    12"/300mm


    Vintage:

    2010


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    PANASONIC E600L

    PANASONIC

    E600L

    Dry / Plasma Etch
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    PANASONIC

    E600L

    verified-listing-icon
    Verified
    CATEGORY
    Dry / Plasma Etch
    Last Verified: Over 60 days ago
    listing-photo-2f440a61106a4de2b32b33fb3a47ad98-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Refurbished


    Operational Status:

    Unknown


    Product ID:

    114506


    Wafer Sizes:

    12"/300mm


    Vintage:

    2010


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    ICP system
    Configuration
    No Configuration
    OEM Model Description
    Plasma Source: ICP Plasma Process Gas: 2Lines (standard) *Maximum 6 Lines (e.g. Chlorinated Gas, Fluoride Gas, Ar, O2, He ) Applicable Wafer: ø100 mm wafer with orientation flat (standard) *Option : ø50 mm, ø75 mm, ø50 mm (with O.F.) Wafer Material: Silicon (standard) *Option : Quartz, GaAs, Sapphire Machine Dimensions / Weight*1: W 1170 mm × D 2650 mm, H 2100 mm / 1900 kg (Main body only) Power Source*2: Single phase AC 200V, 6 kVA and Three-phase AC 200V, 15 kVA (Main body only) Dry Air: 0.49 M Pa to 0.54 M Pa, 40 L / min [A.N.R.] N 2Source: 0.5 M Pa to 0.7 M Pa, 50 L / min
    Documents

    No documents

    Similar Listings
    View All
    PANASONIC E600L

    PANASONIC

    E600L

    Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days ago
    PANASONIC E600L

    PANASONIC

    E600L

    Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days ago
    PANASONIC E600L

    PANASONIC

    E600L

    Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days ago