Description
OXFORD Plasmalab 100 RIE (FL) Reactive Ion EtcherConfiguration
Supports wafer sizes up to 300mm (330mm Platen) RIE set up for SiO2 Etch RF Generator : Advanced Energy RFX 600A ; 600W, 13.56MHz, Chamber Turbo Pump : Alcatel ATH 400M w/ ACT 600M controller Blue color PLC type Water cooled electrode 10C-80C Gas pod with 6 lines including following MFCs: Ar – 100sccm N2 – 200sccm CHF3 – 200sccm NF3 – 200sccm N2O – 200sccm Windows PC , user friendly interface Lauda WK 1200 Chiller was utilized by previous user. Not included.OEM Model Description
None ProvidedDocuments
No documents
Verified
CATEGORY
Dry / Plasma Etch
Last Verified: 7 days ago
Key Item Details
Condition:
Refurbished
Operational Status:
Unknown
Product ID:
138679
Wafer Sizes:
Unknown
Vintage:
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
OXFORD
PLASMAPRO 100
CATEGORY
Dry / Plasma Etch
Last Verified: 7 days ago
Key Item Details
Condition:
Refurbished
Operational Status:
Unknown
Product ID:
138679
Wafer Sizes:
Unknown
Vintage:
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
OXFORD Plasmalab 100 RIE (FL) Reactive Ion EtcherConfiguration
Supports wafer sizes up to 300mm (330mm Platen) RIE set up for SiO2 Etch RF Generator : Advanced Energy RFX 600A ; 600W, 13.56MHz, Chamber Turbo Pump : Alcatel ATH 400M w/ ACT 600M controller Blue color PLC type Water cooled electrode 10C-80C Gas pod with 6 lines including following MFCs: Ar – 100sccm N2 – 200sccm CHF3 – 200sccm NF3 – 200sccm N2O – 200sccm Windows PC , user friendly interface Lauda WK 1200 Chiller was utilized by previous user. Not included.OEM Model Description
None ProvidedDocuments
No documents