Description
No descriptionConfiguration
Reactive Ion EtcherOEM Model Description
The March Jupiter III is a parallel plate reactive ion etcher, which offers fast, uniform, and selective etching. The Jupiter III is typically used for wafer descumming and ashing. The maximum sample size is 6 inches. The system is equipped with a maximum 300W RF power supply. The available process gases are oxygen, argon, and forming gas which are adjustable using a rotameter.Documents
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Verified
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
100339
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
NORDSON / MARCH
Jupiter III
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
100339
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Reactive Ion EtcherOEM Model Description
The March Jupiter III is a parallel plate reactive ion etcher, which offers fast, uniform, and selective etching. The Jupiter III is typically used for wafer descumming and ashing. The maximum sample size is 6 inches. The system is equipped with a maximum 300W RF power supply. The available process gases are oxygen, argon, and forming gas which are adjustable using a rotameter.Documents
No documents