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Description
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Reactive Ion EtcherOEM Model Description
The March Jupiter III is a parallel plate reactive ion etcher, which offers fast, uniform, and selective etching. The Jupiter III is typically used for wafer descumming and ashing. The maximum sample size is 6 inches. The system is equipped with a maximum 300W RF power supply. The available process gases are oxygen, argon, and forming gas which are adjustable using a rotameter.Documents
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Verified
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
100339
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
NORDSON / MARCH
Jupiter III
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
100339
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Reactive Ion EtcherOEM Model Description
The March Jupiter III is a parallel plate reactive ion etcher, which offers fast, uniform, and selective etching. The Jupiter III is typically used for wafer descumming and ashing. The maximum sample size is 6 inches. The system is equipped with a maximum 300W RF power supply. The available process gases are oxygen, argon, and forming gas which are adjustable using a rotameter.Documents
No documents