Description
Vacuum plasma processing systemConfiguration
Chamber volume: 18–36 L, depending on version Tabletop system power supply: 230 VAC Standalone system power supply: 400 VAC, 3-phase Gas supply options: Needle valves Mass flow controllers (MFCs) Vacuum chamber options - Stainless steel: Round chamber with cover: Approx. Ø267 × L420 or L600 mm Rectangular chamber with hinged door: Approx. W240 × H240 × D420 or D600 mm Vacuum chamber options - Aluminum: Round chamber with cover or hinged door Approx. ID240 mm; opening Ø230 mm; L400 or L600 mm Vacuum chamber options - Quartz glass (UHP): Round chamber with cover or hinged door Approx. ID240 mm; opening Ø230 mm; L400 or L600 mm Vacuum chamber options - Borosilicate glass (UHP): Round chamber with cover or hinged door Approx. ID240 mm; opening Ø230 mm; L400 or L600 mm Loading options: Tray with optional water cooling Quartz glass boats Rotary drum for powder Rotary drum for bulk materials Flat trays: Aluminum / stainless steel / borosilicate glass / quartz glass Electrode options: Single-level or multilevel electrode RIE electrode Control options: Semiautomatic PCCE control: Microsoft Windows CE PC control: Microsoft Windows XPE Timer: Digital Generator options: 40 kHz: 0–300 W or 0–1,000 W 13.56 MHz: 0–100 W or 0–300 W 2.45 GHz: 0–600 W Output continuously adjustable from 0–100% Vacuum pump options: Various sizes and manufacturers Optional activated carbon filterOEM Model Description
Low-pressure plasma treatment unitDocuments
No documents
Verified
CATEGORY
Dry / Plasma Etch
Last Verified: 3 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
154930
Wafer Sizes:
Unknown
Vintage:
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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DIENER ELECTRONIC
Nano SL PCCE
CATEGORY
Dry / Plasma Etch
Last Verified: 3 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
154930
Wafer Sizes:
Unknown
Vintage:
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Vacuum plasma processing systemConfiguration
Chamber volume: 18–36 L, depending on version Tabletop system power supply: 230 VAC Standalone system power supply: 400 VAC, 3-phase Gas supply options: Needle valves Mass flow controllers (MFCs) Vacuum chamber options - Stainless steel: Round chamber with cover: Approx. Ø267 × L420 or L600 mm Rectangular chamber with hinged door: Approx. W240 × H240 × D420 or D600 mm Vacuum chamber options - Aluminum: Round chamber with cover or hinged door Approx. ID240 mm; opening Ø230 mm; L400 or L600 mm Vacuum chamber options - Quartz glass (UHP): Round chamber with cover or hinged door Approx. ID240 mm; opening Ø230 mm; L400 or L600 mm Vacuum chamber options - Borosilicate glass (UHP): Round chamber with cover or hinged door Approx. ID240 mm; opening Ø230 mm; L400 or L600 mm Loading options: Tray with optional water cooling Quartz glass boats Rotary drum for powder Rotary drum for bulk materials Flat trays: Aluminum / stainless steel / borosilicate glass / quartz glass Electrode options: Single-level or multilevel electrode RIE electrode Control options: Semiautomatic PCCE control: Microsoft Windows CE PC control: Microsoft Windows XPE Timer: Digital Generator options: 40 kHz: 0–300 W or 0–1,000 W 13.56 MHz: 0–100 W or 0–300 W 2.45 GHz: 0–600 W Output continuously adjustable from 0–100% Vacuum pump options: Various sizes and manufacturers Optional activated carbon filterOEM Model Description
Low-pressure plasma treatment unitDocuments
No documents