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APPLIED MATERIALS (AMAT) CENTURA Silvia Etch
  • APPLIED MATERIALS (AMAT) CENTURA Silvia Etch
  • APPLIED MATERIALS (AMAT) CENTURA Silvia Etch
  • APPLIED MATERIALS (AMAT) CENTURA Silvia Etch
Description
No description
Configuration
Silvia 2ch / Axiom 1ch
OEM Model Description
Applied Materials Centura Silvia Etch system is specifically designed for the challenging deep silicon etch required to create the vertical connections between the chips or wafers. It overcomes the tradeoff between profile control and high etch rate faced by conventional methods. The system’s high-density plasma source enables the highest silicon and oxide etch rates for all wafer-level packaging applications.
Documents

No documents

CATEGORY
Dry / Plasma Etch

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

117022


Wafer Sizes:

12"/300mm


Vintage:

2010


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

APPLIED MATERIALS (AMAT)

CENTURA Silvia Etch

verified-listing-icon
Verified
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
listing-photo-0ace2bbe871a4504bc76f00cbf9cbea4-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

117022


Wafer Sizes:

12"/300mm


Vintage:

2010


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No description
Configuration
Silvia 2ch / Axiom 1ch
OEM Model Description
Applied Materials Centura Silvia Etch system is specifically designed for the challenging deep silicon etch required to create the vertical connections between the chips or wafers. It overcomes the tradeoff between profile control and high etch rate faced by conventional methods. The system’s high-density plasma source enables the highest silicon and oxide etch rates for all wafer-level packaging applications.
Documents

No documents