Description

Centura Hart Number of Chambers 4 Power Requirements 3 Phase CE Marked YES Exterior Dimensions Width 66.929 in (170.0 cm) Depth 96.457 in (245.0 cm) Height 98.031 in (249.0 cm) Weight 4,550 lb (2,064 kg)

Configuration

No Configuration

OEM Model Description

The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.

Documents

No documents

APPLIED MATERIALS (AMAT)

CENTURA

Verified

Dry / Plasma Etch

Last Verified: 11 days ago

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

147425

Wafer Sizes:

8"/200mm

Vintage:

2001

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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