Description
PlasmaConfiguration
2x DTM chambers (Chlorine etcher), 1x Super E chamber (Fluorine etcher )OEM Model Description
The AMAT / APPLIED MATERIALS Centura IPS (induced plasma source) is a dialectric etch system. This AMAT Centura is configured with Inductively Coupled Parallel Plate Semiconductor Dielectric Etch (IPS) chamber. The IPS chamber can be used alone or with other chambers on the Centura platform. The AMAT / APPLIED MATERIALS Centura IPS can be configured for wafer sizes up to 300mm. Applications for the AMAT / APPLIED MATERIALS Centura IPS include etching dual damascene structures in copper-based devices.Documents
No documents
CATEGORY
Dry / Plasma Etch
Last Verified: 13 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
142376
Wafer Sizes:
Unknown
Vintage:
2018
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA IPS
CATEGORY
Dry / Plasma Etch
Last Verified: 13 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
142376
Wafer Sizes:
Unknown
Vintage:
2018
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
PlasmaConfiguration
2x DTM chambers (Chlorine etcher), 1x Super E chamber (Fluorine etcher )OEM Model Description
The AMAT / APPLIED MATERIALS Centura IPS (induced plasma source) is a dialectric etch system. This AMAT Centura is configured with Inductively Coupled Parallel Plate Semiconductor Dielectric Etch (IPS) chamber. The IPS chamber can be used alone or with other chambers on the Centura platform. The AMAT / APPLIED MATERIALS Centura IPS can be configured for wafer sizes up to 300mm. Applications for the AMAT / APPLIED MATERIALS Centura IPS include etching dual damascene structures in copper-based devices.Documents
No documents