We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. Read More
Description
ETCHConfiguration
ETCHOEM Model Description
The Centura II eMax CT+ system is targeted for the most demanding etch applications, including self-aligned, high aspect ratio and logic contacts, as well as dual damascene and low k dielectric films. It can accommodate up to 4 process chambers and 2 auxiliary chambers.Documents
No documents
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
23723
Wafer Sizes:
12"/300mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA II EMAX CT+
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
23723
Wafer Sizes:
12"/300mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
ETCHConfiguration
ETCHOEM Model Description
The Centura II eMax CT+ system is targeted for the most demanding etch applications, including self-aligned, high aspect ratio and logic contacts, as well as dual damascene and low k dielectric films. It can accommodate up to 4 process chambers and 2 auxiliary chambers.Documents
No documents