Description
MISSING PARTS: TWO CHAMBER UNIT PCB THREE TURBO PUMPConfiguration
THREE LORD PORT (ROBOT) THREE CHAMBER(YES) POWER BOX(YES) MAIN BODY (ROBOT YES) REMORT CONTROL(YES) COMPUTER (YES WITH HD)OEM Model Description
The AMAT Centura DPS is a highly efficient semiconductor processing system with a unique architecture that groups four processing stations and two auxiliary chambers around a central transfer module housing an ultra-reliable magnetically-coupled vacuum robot. It is designed for ≤200mm wafer fabrication and supports various applications such as Chemical Vapor Deposition (CVD), epitaxy, etch, plasma nitridation, and Rapid Thermal Processing (RTP).Documents
No documents
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
126501
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA DPS
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
126501
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
MISSING PARTS: TWO CHAMBER UNIT PCB THREE TURBO PUMPConfiguration
THREE LORD PORT (ROBOT) THREE CHAMBER(YES) POWER BOX(YES) MAIN BODY (ROBOT YES) REMORT CONTROL(YES) COMPUTER (YES WITH HD)OEM Model Description
The AMAT Centura DPS is a highly efficient semiconductor processing system with a unique architecture that groups four processing stations and two auxiliary chambers around a central transfer module housing an ultra-reliable magnetically-coupled vacuum robot. It is designed for ≤200mm wafer fabrication and supports various applications such as Chemical Vapor Deposition (CVD), epitaxy, etch, plasma nitridation, and Rapid Thermal Processing (RTP).Documents
No documents