Novellus acquired Gasonics in 2001. Novellus now offers a suite of advanced photoresist strip and clean products. 

LAM RESEARCH / NOVELLUS / GASONICS 

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The SIERRA system is an advanced dry-clean system for 300mm wafer manufacturing processes. It delivers photoresist and residue removal for today’s most advanced applications. The SIERRA system is designed specifically to address the intricate cleaning challenges associated with the industry’s migration to copper metallization and low-k dielectrics. It yields significantly higher capital productivity and significantly lower cost-of-ownership advantages than competing dry-clean systems.

LAM RESEARCH / NOVELLUS / GASONICS

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SIERRA

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