In 1999, we developed the eS20, which has performance enhancements compared to the previous generation of e-beam defect inspection systems. In July of 2000 the eS20XP, which delivers further improvements in sensitivity while increasing throughput.

KLA inhabits two worlds: one that’s nanometers in scale and one that’s global. This micro and macro view gives us a unique perspective. We see electrons wave and industries transform. When you put deep science together with optimism, big things happen.

Our process-control and process-enabling solutions are designed to boost the innovation speed of the electronics industry. We help our customers achieve leading-edge performance.

eS20XP

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