Overview

The WF-731 is a production monitoring system for patterned wafer defect detection that is part of the WF-700 Series Wafer Defect Inspection System. It is designed to enhance yield by providing immediate feedback on critical process steps through its high wafer throughput of 34 WPH at 0.3µm sensitivity. The WF-731, along with the WF-736 DUO engineering analysis system, offers new solutions for yield enhancement by combining brightfield and darkfield imaging. These wafer inspection tools share a common platform, enabling easily transportable engineering recipes and uniformity in training, service, and spare parts. Overall, the WF-731 is a powerful tool for monitoring production processes and detecting defects in patterned wafers.