Overview

The SEMVision G5 suite offers top-tier in-line defect review and analysis for 22nm and beyond, consolidating Applied's leadership in DR. It boasts unparalleled SEM system speed, precision, and intelligence. With the highest image quality, finest pixel resolution, and 1-nanometer pixel size in production (improved from 2nm), it automates the entire review process. The G5 captures images of defects as minuscule as 10nm in a 0.5µm field, offers superior throughput, and the ADRTrue™ feature distinguishes true defects from false. Its imaging capabilities cover material and topographic perspectives and include an enhanced SEM column, novel charging suppression, and new imaging techniques. Advanced algorithms bolster its functionality, and it provides extensive defect analysis on the wafer's edge, bevel, and apex. The unique EDX module identifies defect elemental compositions and facilitates rapid analysis of defects under 30nm. With a 45-degree SEM column rotation and tilt, it offers 3D data for better defect visualization. SEMVision also provides automated Wavelength Dispersive X-ray (WDX) analysis, enabling in-depth defect analyses below 30nm at unmatched speeds.