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AVIZA / WATKINS-JOHNSON WJ-999R
  • AVIZA / WATKINS-JOHNSON WJ-999R
  • AVIZA / WATKINS-JOHNSON WJ-999R
  • AVIZA / WATKINS-JOHNSON WJ-999R
Description
APCVD (Chemical Vapor Deposition)
Configuration
No Configuration
OEM Model Description
The Watkins Johnson (WJ) WJ-999R is an advanced and versatile system designed for chemical vapor deposition (APCVD) applications in semiconductor production lines using 100mm to 150mm wafers. It has the capability to process two wafers simultaneously in parallel, optimizing throughput. The system offers the flexibility to handle both doped and un-doped silicon dioxide processing, making it suitable for a wide range of semiconductor manufacturing requirements.
Documents

No documents

CATEGORY
CVD

Last Verified: Over 30 days ago

Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

119844


Wafer Sizes:

8"/200mm


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

AVIZA / WATKINS-JOHNSON

WJ-999R

verified-listing-icon
Verified
CATEGORY
CVD
Last Verified: Over 30 days ago
listing-photo-8e76028fda724b0aa28d94a4d048e22d-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

119844


Wafer Sizes:

8"/200mm


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
APCVD (Chemical Vapor Deposition)
Configuration
No Configuration
OEM Model Description
The Watkins Johnson (WJ) WJ-999R is an advanced and versatile system designed for chemical vapor deposition (APCVD) applications in semiconductor production lines using 100mm to 150mm wafers. It has the capability to process two wafers simultaneously in parallel, optimizing throughput. The system offers the flexibility to handle both doped and un-doped silicon dioxide processing, making it suitable for a wide range of semiconductor manufacturing requirements.
Documents

No documents